{"created":"2023-07-25T08:06:03.822837+00:00","id":4706,"links":{},"metadata":{"_buckets":{"deposit":"e69eb8cc-5c89-4f3c-8e90-54701283aae4"},"_deposit":{"created_by":18,"id":"4706","owners":[18],"pid":{"revision_id":0,"type":"depid","value":"4706"},"status":"published"},"_oai":{"id":"oai:ir.kagoshima-u.ac.jp:00004706","sets":["228:273:5340","35:36"]},"author_link":[],"item_7_biblio_info_5":{"attribute_name":"収録雑誌名","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1978-09","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"96","bibliographicPageStart":"93","bibliographicVolumeNumber":"20","bibliographic_titles":[{"bibliographic_title":"鹿児島大学工学部研究報告","bibliographic_titleLang":"ja"},{"bibliographic_title":"The research reports of the Faculty of Engineering, Kagoshima University","bibliographic_titleLang":"en"}]}]},"item_7_date_6":{"attribute_name":"作成日","attribute_value_mlt":[{"subitem_date_issued_datetime":"1978-09","subitem_date_issued_type":"Issued"}]},"item_7_description_4":{"attribute_name":"要約(Abstract)","attribute_value_mlt":[{"subitem_description":"Usual sputtering methods have a weakpoint that sputtering current is a little and a sticking velocity is low during the deposition process. We have been troubled by low germanium sticking coefficient in producting a Nb_3Ge thin film. Therefore, in order to make it higher, we manufactured the high rate sputtering apparatus wherein a magnetic field is perpendicular to an electric field in contradiction to a parallel electric field in the former. Utilizing this apparatus, we could increase the sputtering current\nby nearly 2-3×10 times. As a result, germanium sticking coefficicnt was made higher to obtain a stoichi-ometeic Nb_3Ge and also this method was clarified to be very useful in shortening the sputtering time.","subitem_description_language":"en","subitem_description_type":"Other"}]},"item_7_publisher_23":{"attribute_name":"公開者・出版者","attribute_value_mlt":[{"subitem_publisher":"鹿児島大学","subitem_publisher_language":"ja"},{"subitem_publisher":"Kagoshima University","subitem_publisher_language":"en"}]},"item_7_source_id_7":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"0451212X","subitem_source_identifier_type":"PISSN"}]},"item_7_source_id_9":{"attribute_name":"NII書誌ID","attribute_value_mlt":[{"subitem_source_identifier":"AN00040363","subitem_source_identifier_type":"NCID"}]},"item_7_subject_15":{"attribute_name":"NDC","attribute_value_mlt":[{"subitem_subject":"549","subitem_subject_scheme":"NDC"}]},"item_7_version_type_14":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"鶴丸, 哲哉","creatorNameLang":"ja"},{"creatorName":"TSURUMARU, Tetsuya","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"坂元, 渉","creatorNameLang":"ja"},{"creatorName":"SAKAMOTO, Wataru","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"大串, 哲彌","creatorNameLang":"ja"},{"creatorName":"OGUSHI, Tetsuya","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"沼田, 正","creatorNameLang":"ja"},{"creatorName":"NUMATA, Tadashi","creatorNameLang":"en"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2016-10-28"}],"displaytype":"detail","filename":"AN00040363_v20_p93-96.pdf","filesize":[{"value":"1.1 MB"}],"format":"application/pdf","mimetype":"application/pdf","url":{"label":"AN00040363_v20_p93-96.pdf","objectType":"fulltext","url":"https://ir.kagoshima-u.ac.jp/record/4706/files/AN00040363_v20_p93-96.pdf"},"version_id":"513b2777-4c10-4677-b112-022124b5b60b"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"ハイレートスパッタリング装置の製作","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"ハイレートスパッタリング装置の製作","subitem_title_language":"ja"},{"subitem_title":"THE MANUFACTURE OF THE HIGH RATE SPUTTERING","subitem_title_language":"en"}]},"item_type_id":"7","owner":"18","path":["36","5340"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2015-06-16"},"publish_date":"2015-06-16","publish_status":"0","recid":"4706","relation_version_is_last":true,"title":["ハイレートスパッタリング装置の製作"],"weko_creator_id":"18","weko_shared_id":-1},"updated":"2024-02-20T04:58:03.775684+00:00"}